Which one is the strongest reducing agent, HCL, HBr , HI, or HF? - Qu?, Which one is the strongest reducing agent, HCL, HBr , HI, or HF? - Qu?, 28/02/2007 ÿú For HF-oxidizing agent-H 2 O etching system, the etching is a two-step process in which the silicon surface is first oxidized by holes injected into the surface when oxidizing agent is reduced on the cathode . The oxidized surface (the anode) then reacts with HF to form a water-soluble complex.
12/04/2016 ÿú HBr is not an oxidising agent . It is a reducing agent . Order of reducing character of hydrogen halide is given below : HCl HF to HI and reducing character increases in the same direction. HF is not a reducing agent .
01/09/2016 ÿú Distilled water and analytical grade chemicals were utilized to prepare all the leaching solutions. Hydrogen peroxide (H 2 O 2) functioned as an oxidizing agent and hydrofluoric acid (HF) as a leaching agent. 2.2. Apparatus and experimental procedure, Metal hydrides, such as NaH, CaH 2, and LiAlH 4, which formally contain the H - ion, are also good reducing agents. Some compounds can act as either oxidizing agents or reducing agents. One example is hydrogen gas, which acts as an oxidizing agent when it combines with metals and as a reducing agent when it reacts with nonmetals.
All the compounds which are in higher oxidation state are strong oxidizing agent . In case comparison between hno3 and h2so4. H2so4 is strong oxd agent . Because it is in high oxidation state than nitrogen in the given compound(acid) H2so4. S is in oxidation state +6. Hno3. N is in oxd state +5, The reducing agent means to loose electrons it is said to have been oxidized. The element which undergoes oxidation (gets oxidized) is called reducing agent. H 2 O + F 2 ? H F + H O F, HF is a reactive solvent in the electrochemical fluorination of organic compounds. In this approach, HF is oxidized in the presence of a hydrocarbon and the fluorine replaces C?H bonds with C?F bonds. Perfluorinated carboxylic acids and sulfonic acids are produced in this way.
The mechanism of metal-assisted electroless etching of silicon in HF-oxidizing agent-H 2 O etching system as a function of oxidizing agent concentration was studied. Three types of oxidizing agent were experimented namely Na 2 S 2 O 8, K 2 Cr 2 O 7 and KMnO 4. Their concentrations were varied from 0.05 M to 0.3 M. The layers formed on silicon were investigated by scanning electron microscopy.
22/06/2014 ÿú H 2 O + F 2 ? HF + 2HOF 1) H 2 O is oxidised to HOF by losing hydrogen atom. 2) F 2 is reduced to HF by gaining hydrogen atom. 3) The substance which gets oxidised is called reducing agent. Hence H 2 O is reducing agent. 4) The substance which gets reduced is called oxidising agent. Hence F 2 is oxidising agent.
Redox, Combustion, Corrosive Substance, Fire Triangle, Electrochemistry;"